Pulsed DC- Plasma Assisted Chemical Vapor Deposition of α-rich Nanostructured Tantalum Film: Synthesis and Characterization

MD-Simulation of Duty Cycle and TaN Interlayer Effects on the Surface Properties of Ta Coatings Deposited by Pulsed-DC Plasma Assisted Chemical Vapor Deposition

In this work, molecular dynamics (MD) simulations were employed to investigate the effects of duty cycle changes and utilization of tantalum nitride interlayer on the surface roughness and adhesion of Ta coating deposited by pulsed-DC plasma assisted chemical vapor deposition. To examine the simulation results, some selected deposition conditions were experimentally implemented and characterize...

Comparison of Properties of Ti/TiN/TiCN/TiAlN Film Deposited by Cathodic Arc Physical Vapor and Plasma-assisted Chemical Vapor Deposition on Custom 450 Steel Substrates

This study investigated the effects of deposition techniques on the microstructural and tribological properties of Ti/TiN/TiCN/TiAlN multilayer coatings onto a Custom 450 steel substrate. The coatings were produced using cathodic arc physical vapor deposition (CAPVD) and plasma-assisted chemical vapor deposition (PACVD). The microstructural of the coatings was evaluated using (SEM), and phase f...

Influence of pulse power amplitude on plasma properties and film deposition in high power pulsed plasma enhanced chemical vapor deposition

Effect of Temperature and Gas Flux on the Mechanical Behavior of TiC Coating by Pulsed DC Plasma Enhanced Chemical Vapor Deposition(TECHNICAL NOTE)

  There are many factors such as voltages, duty cycle, pressure, temperatures and gas flux in coatings process that were effective in changing coatings characteristic. In this paper in plasma enhanced chemical vapor deposition (PECVD) technique, temperature and gas flux are two important variants that affecting the coatings structure and mechanical properties. All TiC coating deposited on a hot...

Microwave Plasma Assisted Chemical Vapor Deposition of Diamond

Diamond crystal S and p01 ycrystal l i ne diamond fi lms have been depos i e y t h e microwave plasma ass i s t ed C V D method from C H / H mixtures. The i n: :oncentration of methane, the pressure, the temperatu$e, 'the to ta l flow ra t e and the microwave power were varied in large ranges. The morphology of the deposits were s tudied by op t i ca l and scanning e l ec t ron microscopy and t...

Gallium assisted plasma enhanced chemical vapor deposition of silicon nanowires.

Silicon nanowires have been grown with gallium as catalyst by plasma enhanced chemical vapor deposition. The morphology and crystalline structure has been studied by electron microscopy and Raman spectroscopy as a function of growth temperature and catalyst thickness. We observe that the crystalline quality of the wires increases with the temperature at which they have been synthesized. The cry...